اثر تغییرات مورفولوژی سطح بستر در رشد نانوکریستال های الماس به روش HFCVD

نوع مقاله : مقاله پژوهشی

نویسندگان

1 گروه فیزیک، دانشگاه آزاد اسلامی شهرقدس، تهران، ایران

2 دانشکده فنی و مهندسی، دانشگاه میبد، یزد

چکیده

کربن یکی از فعالترین عناصر جدول تناوبی مندلیف با تعداد زیادی آلوتروپ است که از میان آنها، الماس به لحاظ خواص منحصر بفرد آن، همواره مورد توجه بسیاری از پژوهشگران قرار بوده است. از میان روشهای متنوع تولید الماس نانویی، روش رسوب دهی بخارات شیمیایی به کمک فیلامان داغ (HFCVD) از روش های متداول با بازده خوب و کم هزینه نسبت به سایر روش ها محسوب می­شود. این مقاله، به بررسی اثر ریخت­شناسی سطح و نحوه آماده سازی سطح بستر آلومینیوم در رشد و کیفیت نانو کریستالهای الماس به روش HFCVD پرداخته شده است. تغییر ریخت­ شناسی سطح در این مقاله با تغییر زبری روی سطح بررسی شده است. برای ایجاد زبری سطح متفاوت در نمونه ­ها از دستگاه پولیش زنی و خمیر الماس استفاده شده است و آنالیز بررسی تغییر ریخت­ شناسی سطح نمونه ­ها به کمک میکروسکوپ نیروی اتمی (AFM) انجام شده است. برای مقایسه بهینه نتایج آلومینیوم، از یک بستر سیلیکونی به عنوان مرجع که در شرایط یکسان با بسترهای آلومینیومی برای رشد کریستال­های الماس قرار گرفتند، استفاده شده است. از گاز متان و هیدروژن با نسبت 5 به 100 و فلوی کلی حدود sccm300 به برای مدت زمان 60 دقیقه برای رشد کریستال­های الماس بهره گرفته شد. نتایج آنالیز پراش پرتو ایکس (XRD)، افزایش شدت و کیفیت الماس را با کاهش زبری بستر آلومینومی را نشان دادند. از مقایسه نتایج بستر آلومینیم در حالت بهینه با نتایج سیلیکون مشاهده شد که کیفیت رشد کریستال­های الماس در آلومینیم با میانگین زبریnm11/37ازبستر مرجع سیلیکون بهتر است.

کلیدواژه‌ها

عنوان مقاله [English]

Effect of Different Surface Morphology on Growth of Nanocrystalline Diamond by HFCVD

نویسندگان [English]

  • Zahra Khalaj 1
  • Fatemeh Shahsavari 2
1 -Physics department, Shahr-e-Qods branch, Islamic Azad University, Tehran, Iran. -Academic Member & Dean of Young Researchers and Elite Club
2 Faculty of Engineering, Meybod university, Yazd, Iran
چکیده [English]

Carbon is one of the most important element in Periodic Table which consist of several allotropes. Among various allotropes of carbon, Diamond is one of the remarkable one because of its outstanding properties which attracts many researchers. There is various method for diamond production that Hot filament Chemical Vapor Deposition (HFCVD) is most commercial due to its low cost and high production ratio in comparison with other methods. In this paper, the effect of surface morphology variance and treatment methods on surface roughness were investigated. The substrate was polished with Diamond paste and polishing system. The roughness of the substrates was analyzed with Atomic Force Microscopy (AFM). The result of the optimum Al substrate was compared with Si-Au substrate as a reference. A combination of CH4/H2 with 5% flow ratio and 300 sccm flow ratio for 60 minutes was fed into the reaction chamber. The result of the X-ray diffraction method (XRD) illustrated the high intensity and high-quality diamond production was obtained with decreasing the Aluminum surface roughness. The results show that the quality of the diamond in Al substrate with 11.37nm average roughness is better than silicon coated gold as a reference.

کلیدواژه‌ها [English]

  • Surface Roughness
  • Morphology
  • Diamond
  • HFCVD

مراجع

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دنیای نانو
دوره 18، شماره 67
شهریور 1401
صفحه 20-27

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سابقه مقاله

  • تاریخ دریافت: 20 اسفند 1400
  • تاریخ بازنگری: 31 فروردین 1401
  • تاریخ پذیرش: 18 اردیبهشت 1401

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